专用集成电路与系统国家重点实验室
讲座信息

题  目:Lithography Aware Physical Design
报告人:Martin D.F. Wong (Department of Electrical and Computer Engineering University of Illinois at Urbana-Champaign)
时  间:2013年7月19日(周五)9:30-10:30
地  点:张江校区微电子楼369室

Abstract:
In this talk, we will summarize a few of our recent results in lithography aware physical design. We will present algorithms for wire routing and optimization for the leading multiple patterning lithography technologies such as LELE double patetrning, LELELE triple patterning, and self-aligned double patterning (SADP). We will also discuss a layout optimization problem which is applicable to the direct self-assembly (DSA) technology.

Bio:
Martin D.F. Wong received his B.Sc. degree in Mathematics from the University of Toronto and M.S. degree in Mathematics from the University of Illinois at Urbana-Champaign (UIUC). He obtained his Ph.D. degree in Computer Science from UIUC in 1987. From 1987 to 2002, he was a faculty member in Computer Science at the University of Texas at Austin. He returned to UIUC in 2002 where he is currently the Acting Associate Dean for Academic Affairs in the College of Engineering and the Edward C. Jordan Professor in Electrical and Computer Engineering. He has published over 400 technical papers and graduated more than 40 Ph.D. students in the area of Electronic Design Automation (EDA). He has won a few best paper awards for his works in EDA. He has served on many technical program committees of leading EDA conferences. He has also served on the editorial boards of IEEE Transactions on Computers, IEEE Transactions on Computer-Aided Design, and ACM Transactions on Design Automation of Electronic Systems. He was an IEEE Distinguished Lecturer in 2005 and 2006. He is a Fellow of IEEE.

 
 
 
 

 

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