专用集成电路与系统国家重点实验室
系列讲座之十五

题  目:Advanced Foundry CMOS Technology: From Planar Into The Multi-Gate Era
报告人:Dr. Matthias Goldbach, GLOBALFOUNDRIES
时  间:2011年12月5日上午10:00-11:00
地  点:邯郸校区净化楼B213

Abstract
Foundries provide customers with leading-edge technology, on schedule, and to specifications co-optimized with the customer. Their technology is SoC focused with large variety of active and passive devices to fulfill customers’ needs. Planar CMOS on a bulk substrate has been the workhorse of the foundry industry for both high performance and low power products. Further scaling of this technology is demanding; a change in concept is required for future technology nodes. This presentation discusses multi-gate and single gate approaches that have been proposed in literature. Compatibility with SoC requirements, manufacturability, scalability, and market-options are compared and evaluated.

 
 
 
 

 

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