专用集成电路与系统国家重点实验室
系列讲座之十一

题  目:Challenges and Strategies in Advanced CMOS
报告人:Dr. Xiaomeng Chen (IBM美国公司)
时  间:2011年11月5日上午10:00-11:00
地  点:邯郸校区微电子学楼B213室

Biography
Xiaomeng Chen is the Senior Manager of Advanced Process Development organization in Semiconductor Research and Development Center (SRDC) in Microelectronics Division of IBM. She is responsible for the process development and qualification of many kinds of advanced materials/processes including Gate Dielectric, Insulator, Metallization, CMP, Plating, Wets, RTA, Epitaxy growth, Diffusion, for various technology nodes covering from 32nm to 14nm. In her career in IBM prior to the current position, Xiaomeng Chen has been the technical leader or manager for development of many semiconductor technologies, including BEOL integrator of 180nm and 130nm, 90nm FEOL integrator, FEOL integration manager of 90nm and 45nm.

Xiaomeng Chen received B.S of Chemistry from Zhejiang University, and received M.S of Chemistry and PhD of Chemistry/Material Science from University of Albany, USA. She owns 12 US patents and 30+ publications. She was awarded “Technology All-Stars Award” at the National Women of Color Technology Conference, USA, in 2007. She is IEEE member and served in Process Technology subcommittee and session co-chairs in IEDM (international Electron Devices Meeting) conference in 2008/09.

 
 
 
 

 

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