Lithography Challenges for 20nm and Beyond

时  间:2011年上午3月15日9:30-11:30
地  点:邯郸校区物理楼138会议室
报告人:
Anthony Yen,Taiwan Semiconductor Manufacturing Company

Abstract
In this talk I will first briefly review the progress of optical microlithography - the enabler of the microelectronics industry. This technology, in its conventional form, has reached its limit at the 28-nm generation. Continuing the pace of areal density increase of integrated circuits will require us to consider new lithographic technologies. The interim solution may be what is called optical double patterning - halving the minimum pitch by processing the same circuit layer twice using state-of-the-art exposure tools and processes. Beyond the 20 nm generation, however, next-generation lithography (NGL) technologies are being seriously considered to replace optical lithography altogether. I will discuss two leading contenders of NGL: multiple-electron-beam direct write (MEBDW) and extreme-ultraviolet (EUV). Both technologies have demonstrated much finer resolution beyond that of optical lithography. Solid progress on technology development has been made. Eventually, successful adoption of these technologies for high-volume manufacturing will depend on timing and cost-of-ownership (CoO). In the case of EUV, a key component in the CoO determination is the ultimate achievable power from EUV light sources. In addition, the associated technology infrastructure, especially in the mask area, needs to be developed speedily to meet the required deadline, which is nearing.

Biography
Anthony Yen (嚴濤南) is currently Director, Patterning Infrastructure Development Program at Taiwan Semiconductor Manufacturing Company (TSMC). He was previously Senior Vice President with Cymer Inc., a key supplier of semiconductor processing equipment. He began his career with Texas Instruments. Mr. Yen studied physics (激光物理專業) at Fudan University and received his bachelor’s degree in electrical engineering from Purdue University. He received his master’s, engineer’s, and doctoral degrees in electrical engineering from Massachusetts Institute of Technology, and his MBA degree from MIT’s Sloan School of Management. Mr. Yen has published over sixty articles and holds fifteen U.S. patents on semiconductor technology. He is a recipient of the Graduate Teaching Award from EECS Department of MIT and served as Adjunct Professor of Physics at Southern Methodist University as well as a short-course lecturer at IEDM. He is a fellow of SPIE.

 
 
 
 

 

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