胡春凤,女,1984年4月出生。分别于2006年6月和2009年6月毕业于苏州大学微电子学与固体电子学专业,获学士和硕士学位。2009年7月起在复旦大学微电子研究院从事本科生集成电路工艺实验和晶体管IC测试实验教学工作。

研究方向
集成电路工艺、半导体器件物理、薄膜晶体管的退化机制研究。

代表性论文
1. Chunfeng HU, Mingxiang WANG, Meng ZHANG, Man WONG, “Degradation of Solution based Metal Induced Laterally Crystallized p-Type Polysilicon Thin Film Transistors under DC bias Stresses”, IEEE International Reliability Physics Symposium, Phoenix, USA, 2008, pp. 363-367.
2. Chunfeng HU, Mingxiang WANG, Bo ZHANG, Man WONG, “Negative Bias Temperature Instability Dominated Degradation of Metal-Induced Laterally Crystallized p-Type Polysilicon Thin Film Transistors,” IEEE Transactions on Electron Device, Vol.56(4), 2009.
3. Mingxiang WANG, Chunfeng HU, Yan ZHOU, Meijuan XU, “Comparison of Device Degradation of n-Type Metal Induced Laterally Crystallized Poly-Si TFTs With or Without Hydrogenation,” IEEE International Reliability Physics Symposium, Montreal, Canada, 2009, pp. 960-963.
4. Chunfeng HU, Mingxiang WANG, Meijuan XU, “Hot Carrier Stress Induced Negative Differential Resistance in the Output Characteristic of Poly-Si TFTs, ” IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, Singapore, 2010.

 
 
 
 

 

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